Nanostructure integration in MEMS sensor : Fabrication And Development Process

The trend of integrating nanostructure to elevate the MEMS capability is becoming a trend in microelectronic sensor field. Critical functional element of sensors in the scale of 10 -6 and 10 -9 m in any dimension being incorporated with appropriate nanostructure as part of the sensor systems through two basic approaches: topdown and bottom up. The techniques and methods of both approaches will be explicitly discussed to provide a strong fundamental understanding and overview of the nanostructure fabrication and development process. The significant factors that influence the structure will be revealed as well as the potential application area and limitations of such structure. On top of that, examples of the established integration of nanostructure in MEMS will also be presented. In the conclusions, this paper will emphasize the promising and potential of nanostructure function in the developing ultra sensitive and exceptional accuracy MEMS sensor to reconcile with the future requirements.